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Epitaksial'nye Sloi Nitridov Alyuminiya I Galliya Na Kremnii Vasiliy Bessolov Russian edition
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Epitaksial'nye Sloi Nitridov Alyuminiya I Galliya Na Kremnii
Vasiliy Bessolov
Nitrid gallievye struktury, kotorye shiroko ispol'zuyutsya v elektronnykh i optoelektronnykh priborakh, v nastoyashchee vremya preimushchestvenno vyrashchivayut na sapfirovykh i karbid-kremnievykh podlozhkakh. V poslednee vremya voznik interes k polucheniyu takikh struktur na kremnievoy podlozhke. Eto obuslovleno perspektivami integratsii nitrid-gallievoy i kremnievoy elektroniki, vozmozhnost'yu ispol'zovaniya podlozhek bol'shikh (do 300 mm) razmerov, ikh nizkoy stoimost'yu, khoroshey elektricheskoy provodimost'yu. V obzore predstavleny eksperimental'nye rezul'taty epitaksial'nogo rosta, naibolee deshevym metodom - metodom gazofaznoy khloridno-gidridnoy epitaksii, sloev nitridov galliya i alyuminiya na kremnievoy podlozhke. Obsuzhdaetsya novyy podkhod podavleniya protsessa obrazovaniya dislokatsiy i odnovremennogo snizheniya uprugoy deformatsii v nitridnykh sloyakh na podlozhke kremniya za schyet primeneniya tonkogo dopolnitel'nogo sloya karbida kremniya. Avtorami rassmotreny vozmozhnosti epitaksial'nogo rosta sloev nitrida galliya v polupolyarnom napravlenii na planarnoy podlozhke kremniya. Kniga budet polezna kak studentam i aspirantam, tak i professionalam v oblasti geteroepitaksii sloev na kremnii.
| Media | Books Paperback Book (Book with soft cover and glued back) |
| Released | April 24, 2013 |
| ISBN13 | 9783659358326 |
| Publishers | LAP LAMBERT Academic Publishing |
| Pages | 72 |
| Dimensions | 150 × 4 × 225 mm · 125 g |
| Language | German |
See all of Vasiliy Bessolov ( e.g. Paperback Book )