Hf-Based High-k Dielectrics: Process Development, Performance Characterization, and Reliability - Synthesis Lectures on Solid State Materials and Devices - Young-Hee Kim - Books - Springer International Publishing AG - 9783031014246 - December 31, 2007
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Young-Hee Kim
Hf-Based High-k Dielectrics: Process Development, Performance Characterization, and Reliability - Synthesis Lectures on Solid State Materials and Devices

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Hard breakdown and soft breakdown, particularly the Weibull slopes, were studied under constant voltage stress. The origin of soft breakdown (first breakdown) was studied and the results suggested that the soft breakdown may be due to one layer breakdown in the bilayer structure (HfO2/SiO2: 4 nm/4 nm).

92 pages, X, 92 p.

Media Books     Paperback Book   (Book with soft cover and glued back)
Released December 31, 2007
ISBN13 9783031014246
Publishers Springer International Publishing AG
Pages 92
Dimensions 150 × 220 × 10 mm   ·   212 g
Language English  

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