Simulation of Deposition Processes with PECVD Apparatus - Juergen Geiser - Books - Nova Science Publishers Inc - 9781621003656 - 2012
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Juergen Geiser
Simulation of Deposition Processes with PECVD Apparatus

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Discusses the study of simulating the growth of a thin film by chemical vapour deposition (CVD) processes. This title presents underlying hierarchy of models for low-temperature and low-pressure plasma in order to discuss the processes that can be used to implant or deposit thin layers of important materials.

144 pages, Illustrations

Media Books     Hardcover Book   (Book with hard spine and cover)
Released 2012
ISBN13 9781621003656
Publishers Nova Science Publishers Inc
Pages 144
Dimensions 162 × 234 × 14 mm   ·   352 g

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