Optical and EUV Lithography: A Modeling Perspective - Press Monographs - Andreas Erdmann - Books - SPIE Press - 9781510639010 - April 30, 2021
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Andreas Erdmann
Optical and EUV Lithography: A Modeling Perspective - Press Monographs

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Introduces interested students with backgrounds in physics, optics, computational engineering, mathematics, chemistry, material science, nanotechnology, and other areas to the fascinating field of lithographic techniques for nanofabrication. It should also help senior engineers and managers expand their knowledge of alternative methods and applications.

374 pages

Media Books     Paperback Book   (Book with soft cover and glued back)
Released April 30, 2021
ISBN13 9781510639010
Publishers SPIE Press
Pages 374
Dimensions 255 × 178 × 24 mm   ·   682 g

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