Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications - Tommi Kaariainen - Books - John Wiley & Sons Inc - 9781118062777 - June 28, 2013
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Tommi Kaariainen
Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications 2nd edition

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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective.

272 pages

Media Books     Hardcover Book   (Book with hard spine and cover)
Released June 28, 2013
ISBN13 9781118062777
Publishers John Wiley & Sons Inc
Pages 272
Dimensions 240 × 164 × 25 mm   ·   582 g
Language English  

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