Machine Learning-Based Modelling in Atomic Layer Deposition Processes - Emerging Materials and Technologies - Oluwatobi Adeleke - Books - Taylor & Francis Ltd - 9781032386706 - December 15, 2023
In case cover and title do not match, the title is correct

Oluwatobi Adeleke
Machine Learning-Based Modelling in Atomic Layer Deposition Processes - Emerging Materials and Technologies

Price
HK$ 2,016
excl. VAT

Ordered from remote warehouse

Expected to be ready for shipping May 27 - Jun 8

Our customers say:

14-day return policy in accordance with European consumer protection law
Top ranking on Trustpilot
Add to your iMusic wish list

Also available as:

This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

496 pages, 102 Line drawings, black and white; 24 Halftones, black and white; 126 Illustrations, bla

Media Books     Hardcover Book   (Book with hard spine and cover)
Released December 15, 2023
ISBN13 9781032386706
Publishers Taylor & Francis Ltd
Pages 354
Dimensions 150 × 220 × 20 mm   ·   662 g
Language English  

Mere med samme udgiver

See all of Oluwatobi Adeleke ( e.g. Hardcover Book and Paperback Book )