Photomask and Next-generation Lithography Mask Technology IX (Proceedings of SPIE) - Hoh - Books - SPIE Press - 9780819445179 - July 31, 2002
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Photomask and Next-generation Lithography Mask Technology IX (Proceedings of SPIE)

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This text examines photomask and next-generation lithography mask technology.

112 pages

Media Books     Paperback Book   (Book with soft cover and glued back)
Released July 31, 2002
ISBN13 9780819445179
Publishers SPIE Press
Pages 112
Dimensions 150 × 220 × 10 mm   ·   252 g   (Weight (estimated))

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