Sub-Half-Micron Lithography for ULSIs - Katsumi Suzuki - Books - Cambridge University Press - 9780521022347 - November 10, 2005
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Katsumi Suzuki
Sub-Half-Micron Lithography for ULSIs

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This book describes advanced techniques under development in Japan and elsewhere that represent the key to future semiconductor-device fabrication. Several important lithography methods, such as deep UV, X-ray, electron-beam, and focused ion-beam lithography are described in detail by experts. The principles underlying each of the techniques are illustrated at the beginning of each chapter.

344 pages, 103 b/w illus. 43 tables

Media Books     Paperback Book   (Book with soft cover and glued back)
Released November 10, 2005
ISBN13 9780521022347
Publishers Cambridge University Press
Pages 344
Dimensions 188 × 247 × 23 mm   ·   666 g
Language English  
Editor Matsui, Shinji (Nano-scale Science and Technology Group, Himeji Institute of Technology)
Editor Ochiai, Yukinori (NEC Corporation, Tsukuba, Japan)
Editor Suzuki, Katsumi (NEC Corporation, Tsukuba, Japan)

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